AJA ORION 3 METAL SPUTTERING


OPERATING INSTRUCTIONS |

GENERAL INFORMATION

This system consists of 3 2” magnetron sputtering guns. Substrates of up to 4” in size can be coated. System contains a load lock and is dedicated to metal film sputtering. Substrate bias is now available. Reactive sputtering is available as well.

Materials available: Undoped Si, W, Ti, Cr, Al, Mo. Other materials may be possible upon request.

CONTACT INFORMATION
For additional information about the Angstrom EvoVac Deposition System, please contact James Vichiconti at jv2534@columbia.edu or the clean room staff at: cnicleanroom@columbia.edu.