LPCVD EXPERTECH FURNACE
OPERATING INSTRUCTIONS | MANUAL
The Low pressure chemical vapor deposition LPCVD furnace is consisting of 4 tubes for diffusion growth of SiC, Si3N4, Oxidation, and anneal. It uses heat to initiate reactions between precursors in the gas phase to growth high quality films on the substrate. The reaction forms at the interface with the substrate when the active species diffuse through the new film which is being grown. No metals are allowed inside the CNI clean room furnace.
For additional information about the Expertech LPCVD furnace, please contact James Vichiconti at firstname.lastname@example.org or email the clean room staff at email@example.com.