NANOBEAM nB4 ELECTRON BEAM LITHOGRAPHY


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OPERATING INSTRUCTIONS | STANDARD OPERATING INSTRUCTIONS (UPDATED) 

GENERAL INFORMATION

The Nanobeam nB4 is a commercial-grade Gaussian round-beam vector-scan electron beam lithography system that uses a step-and-repeat method for nanopatterning. The innovative design, with a short column and a small footprint offer enhance stability and tolerance to ambient conditions, including room temperature, stray field, and floor vibrations. The system operates at accelerating voltages up to 100 kV (80 kV is typical), and its 10-chuck airlock can accept a wide range of sample sizes, from small pieces to 200 mm wafers. The flexible electron optics is capable of sub-10 nm resolution, and the probe current can be easily adjusted over 3 orders of magnitude, so that fast writing speeds, enabled by a 55 MHz pattern generator with 20 bit DACs, can be achieved for a broad range of feature sizes.  The system is highly automated, including alignment/registration mark recognition for an assortment of mark types, as well as autofocus and autostigmation.  The software is easy to learn and to use, and exposure jobs can be run unattended.

A link to a EE clip showing the Nanobeam lab (minute 1:08) can be found here.

For more information please contact the clean room staff at cnicleanroom@columbia.edu.