NANONEX NX-B200 IMPRINTER


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The Nanonext imprinter is not available at this time.


GENERAL INFORMATION
Nanoimprint Lithography is a new way of nanopatterning and a revolutionary solution to nanomanufacturing. NIL patterns nanostructures by the physical deformation of a deformable material using a mold. NIL can have sub-5 nm resolution and 1% CD control, and simultaneously achieve high-throughput at sub-10 nm resolution.
Nanonex utilizes patented Air Cushion PressTMto ensure maximum nanoimprint uniformity. The unique Smart Sample Holder design allows the handling of samples of different sizes and irregular shapes.

  • Full-wafer nanoimprinting tool for thermoplastic and thermal curable resists
  • Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
  • High throughput due to full-wafer imprinting and minimized thermal mass
  • Smart Sample Holder for handling different sizes and irregular shapes Applications in opto, displays, biotechnologies, data storage, materials, etc

CONTACT INFORMATION
For additional information about the Nanonex NX-B200, please contact James Vichiconti at jv2534@columbia.edu.