NANONEX NX-B200 IMPRINTER
The Nanonext imprinter is not available at this time.
Nanoimprint Lithography is a new way of nanopatterning and a revolutionary solution to nanomanufacturing. NIL patterns nanostructures by the physical deformation of a deformable material using a mold. NIL can have sub-5 nm resolution and 1% CD control, and simultaneously achieve high-throughput at sub-10 nm resolution.
Nanonex utilizes patented Air Cushion PressTMto ensure maximum nanoimprint uniformity. The unique Smart Sample Holder design allows the handling of samples of different sizes and irregular shapes.
Full-wafer nanoimprinting tool for thermoplastic and thermal curable resists
Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
High throughput due to full-wafer imprinting and minimized thermal mass
Smart Sample Holder for handling different sizes and irregular shapes Applications in opto, displays, biotechnologies, data storage, materials, etc
For additional information about the Nanonex NX-B200, please contact James Vichiconti at firstname.lastname@example.org.