HEIDELBERG µPG 101 LASER WRITER
HEIDELBERG WEBSITE | OPERATING INSTRUCTIONS | MORE INFORMATION
The μPG 101 is an extremely economical and easy to use micro pattern generator for direct writing applications and low volume mask making. The system can be used for applications like MEMS, BioMEMS, Integrated Optics, Micro Fluidics or any other application that requires high precision, high resolution microstructures. The system is now available to use in the new clean room (no chemicals are allowed in the space).
KEY FEATURES AND OPTIONS
- Substrates up to 100 x 100 mm2
- Structures down to 1 μm
- Address grid down to 40 nm for the 1 μm and 120 nm for the 3 μm.
- Vector and Raster exposure mode
- 3D exposure mode
- Standard or UV laser source
- Multiple data input formats (DXF, CIF, BMP)
- Camera system for alignment
Lithography Materials and Processing Capabilities
The µPG works with a laser wavelength of either 405 nm or 375 nm (UV option). To do lithographic exposures, the photosensitive coating of the substrates has to be chosen according to the wavelength used and the intended application. Standard substrates for masks are chromium coated plates of float glass or quartz (depending on the requirements concerning temperature stability) with anti-reflection layer (e.g., chromium-oxide), or silicium wafers. Recommended photoresist coatings are:
- binary exposures (2D) on thin resists (~5000 Å):
- S1805: A Shipley resist from the S1800 family that is spin-coated to 0.5 µm thickness
- AZ1350, AZ1505: Clariant resists which are comparable to the S1805
- 3D resists structuring:
- AZ4562: A Clariant resist with a thickness of ~6 µm (exact number depends on coating process)
- AZ9260: Another Clariant resist with higher quality that can be coated with higher thickness.
- SU-8: negative photoresist, requires UV option.
For additional information about the Heidelberg µPG 101 Laser Writer, please contact James Vichiconti at email@example.com or email the clean room staff at firstname.lastname@example.org.