AJA ORION 3 METAL SPUTTERING
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OPERATING INSTRUCTIONS |
GENERAL INFORMATION
This system consists of a 4” magnetron sputtering gun. Substrates of up to 4” in size can be coated. System contains a load lock and is dedicated to metal film sputtering. Substrate bias is now available. Reactive sputtering with nitrogen or oxygen is available as well.
Materials available: Undoped Si, SiO2, ITO, Cu, SiC, W, Mo, Ti, Cr, Al. Other materials may be possible upon request.
CONTACT INFORMATION
For additional information about the AJA Deposition System, please contact the clean room staff at: cniCR@columbia.edu.