AJA ORION 3 METAL SPUTTERING

OPERATING INSTRUCTIONS |

GENERAL INFORMATION
This system consists of a 4” magnetron sputtering gun. Substrates of up to 4” in size can be coated. System contains a load lock and is dedicated to metal film sputtering. Substrate bias is now available. Reactive sputtering with nitrogen or oxygen is available as well.

Materials available: Undoped Si, Ti, Cr, Al. Other materials may be possible upon request.

CONTACT INFORMATION
For additional information about the AJA Deposition System, please contact the clean room staff at: cniCR@columbia.edu.