GENERAL INFORMATION | STANDARD OPERATING PROCEDURE

Location: Havemeyer 544

This XPS system is used for thin film surface analysis of elemental composition and chemical bonding states. The system consists of a 75x75mm2 sample holder, X-ray Mg/Al dual anode source and an additional monochromatic Al source. Ar ion gun (Perkin-Elmer 04-303A) is used for in-situ sputtering, for pre-cleaning the surface and for depth profiling.

For more information please contact Dr. Philippe Chow.