PHI 5500 XPS

GENERAL INFORMATION | STANDARD OPERATING PROCEDURE

Location: Havemeyer 544

PHI 5500 X-ray Photoelectron Spectrometer

The PHI 5500 is an X-ray photoelectron spectrometer (XPS) used for thin film surface analysis of elemental composition and chemical bonding states. This instrument uses X-ray irradiation to eject core-level electrons from the sample surface, measuring their kinetic energies to identify elements and their chemical states within the top 1-10 nm of the material. The system is equipped with an X-ray Mg anode source. It provides quantitative elemental analysis (excluding hydrogen and helium) with detection limits in the 0.1-1 atomic percent range, and chemical state information through analysis of binding energy shifts. The system features a 75x75 mm² sample holder and operates under ultra-high vacuum (UHV) conditions to ensure contamination-free analysis.

It is commonly used for analyzing thin films, coatings, catalysts, semiconductors, polymers, metals, ceramics, and nanomaterials. Applications include surface composition analysis, contamination identification, depth profiling, failure analysis, corrosion studies, and characterization of surface treatments and functionalization.

For more information please contact Dr. Luca Telesca.