RCA STATION

GENERAL INFORMATION

The RCA station is a designated wet bench for SC1 (DI water:NH4OH:H2O2 5:1:1), SC2 (DI water:HCL,H2O2 6:1:1), and HF dip. The station can be used for cleaning and native oxide strip for both wafers and pieces. Training is required in order to use the station.

CONTACT INFORMATION

For additional information about the wet processing hoods or to request training, please contact James Vichiconti or contact the clean room staff at: cniCR@columbia.edu.