SPIN RINSE DRYER

GENERAL INFORMATION |

Spin Rinse Dry (SRD) is a refurbished Verteq 4" compatible wafer rinsing system using DI water and drying using nitrogen. The system is located in the wet processing bay in the clean room.

CONTACT INFORMATION

For additional information about the wet processing hoods or to request training, please contact James Vichiconti or contact the clean room staff at: cniCR@columbia.edu.