SPIN RINSE DRYER
+ SHARED LABS HOME
+ EXTERNAL USER PROGRAM
+ CNI LABS NEWSLETTER
+ BADGER
+ CLEAN ROOM
- CLEAN ROOM HOME
- CLEAN ROOM ACCESS PROTOCOL
- EQUIPMENT TRAINING
- PROCESS & FABRICATION
- EQUIPMENT LIST
- EQUIPMENT RATES & SUPERUSERS
- EQUIPMENT STATUS
- SAFETY
- RELATED LINKS
+ ELECTRON MICROSCOPY
- EM LAB HOME
- SERVICE REQUEST FORM
- EM LAB ACCESS
- TRAINING & CERTIFICATION
- EQUIPMENT LIST & RATES
- FEI TALOS S-TEM
- ZEISS SIGMA VP SEM
- EM IMAGE GALLERY
+ SHARED MATERIAL CHARACTERIZATION LAB
GENERAL INFORMATION |
Spin Rinse Dry (SRD) is a refurbished Verteq 4" compatible wafer rinsing system using DI water and drying using nitrogen. The system is located in the wet processing bay in the clean room.
CONTACT INFORMATION
For additional information about the wet processing hoods or to request training, please contact the clean room staff at: cniCR@columbia.edu.