This Sigma family SEM features a Gemini objective lens design and Schottky Thermal Field Emission that combines electrostatic and magnetic fields to maximize optical performance while minimizing field influences on the sample. The SEM employs several complementary detection techniques, including EDS and EBSD, to characterize samples. While the microscope is not primarily intended for imaging biological samples, exceptions can be made with specific approval from lab staff. For imaging non-conductive samples, it is recommended to use the Sputter-Coater machine located in the room.

The SEM is located in CEPSR 1016 and maintained by the staff of the CNI.

SEM Standard Operating Procedure | Sign-up for SEM Training & Access

Capabilities:

• Imaging resolution up to 5 nm.

• EDS - Elemental Analysis (Energy-dispersive X-ray spectroscopy) - Bruker XFlash® 6 | 30 Detector — EDS Standard Operating Procedure — User Manual

  Introduction to EDS Analysis - Characteristic X-ray table

• EBSD - Phase and Orientation Mapping (Electron Back scattered Diffraction) - EDAX Hikari Plus — EBSD Standard Operating Procedure — TEAM Manual — OIM Manual (100MB)

• Manufacturer: Zeiss

• Model: SIGMA VP

• Wafer Size: 100 mm

• Resolution: 12.00 Å

• Magnification: 10X to 1,000,000X

• Electron Gun: Schottky Thermal Field Emission Type

• Extracting Voltage (Vext): 0 to 6.5kV

• Acceleration Voltage (Vacc): 0 to 30 kV

MACHINE SCHEDULE

For an introductory period, training is conducted by experienced and trained representatives of each research group. Certification is done by the superuser only.

ZEISS SEM SUPERUSERS AND STAFF:

• SEM Access, EDS Training and EBSD Training.

Hans G. J. Blomenkamp | hb2694@columbia.edu (superuser)

Tongwei Xu | tx2218@columbia.edu (superuser)

Dr. Amir ZangiAbadi | az2476@columbia.edu (EM lab director)

Dr. Nava Ariel-Sternberg | na2661@columbia.edu