ZEISS SIGMA VP SCANNING ELECTRON MICROSCOPE
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- ZEISS SIGMA VP SEM
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This Sigma family new Schottky Thermal Field emission SEM consists of Gemini objective lens design combining electrostatic and magnetic fields to maximize optical performance while reducing field influences at the sample to a minimum. The SEM uses several complimentary detection technologies to characterize the imaged samples including recently installed EDS and EBSD. The microscope is not designated for biological sample imaging, but this can be allowed for certain cases with specific approval from the lab staff. If you need to image non-conductive samples, it is recommended to use the Sputter-Coater machine located inside the room.
The SEM is located in CEPSR 1016 and maintained by the staff of the CNI.
SEM Standard Operating Procedure | Sign-up for SEM Training & Access
Capabilities:
Imaging resolution up to 5 nm.
EDS - Elemental Analysis (Energy-dispersive X-ray spectroscopy) - Bruker XFlash® 6 | 30 Detector — EDS Standard Operating Procedure — User Manual
EBSD - Phase and Orientation Mapping (Electron Back scattered Diffraction) - EDAX Hikari Plus — EBSD Standard Operating Procedure — TEAM Manual — OIM Manual (100MB)
Manufacturer: Zeiss
Model: SIGMA VP
Wafer Size: 100 mm
Resolution: 12.00 Å
Magnification: 10X to 1,000,000X
Electron Gun: Schottky Thermal Field Emission Type
Extracting Voltage (Vext): 0 to 6.5kV
Acceleration Voltage (Vacc): 0 to 30 kV
For an introductory period, training is conducted by experienced and trained representatives of each research group. Certification is done by the superuser only.
ZEISS SEM SUPERUSERS AND STAFF:
SEM Access, EDS Training and EBSD Training.
Hans G. J. Blomenkamp | hb2694@columbia.edu (superuser)
Tongwei Xu | tx2218@columbia.edu (superuser)
Dr. Amir ZangiAbadi | az2476@columbia.edu (EM lab director)
Dr. Nava Ariel-Sternberg | na2661@columbia.edu