ELIONIX BODEN 50F ELECTRON BEAM LITHOGRAPHY
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GENERAL INFORMATION
The Elionix ELS-BODEN 50F is a 50kV electron beam lithography system with high through-put boasting a 1000um write-field showcasing the new ELMS software with Python scripting capabilities.
Key Features:
Minimum Line Width: Achieve patterns with a minimum line width of less than 10 nm.
Maximum Beam Current: Maximum beam current of 100 nA.
Beam Scan Speed: Benefit from a high beam scan speed of 100 MHz, enabling higher pixel density and enhanced throughput.
Maximum Specimen Size: Accommodate projects with a maximum specimen size of 8-inch wafers or 7-inch masks.
Stitching Accuracy: Ensure precision with a stitching accuracy of 15 nm.
Overlay Accuracy: Achieve results with an overlay accuracy of 20 nm.
Dual-Beam capability for shorter dwell-times and pattern writing.
Columbia University is excited to leverage the capabilities of the Elionix ELS-BODEN 50F to advance innovative research and drive scientific discovery. Reach out to us for more information on how this tool can help you in your research and projects.
For more information please contact the clean room staff at: cniCR@columbia.edu.