Clean Room Equipment List

Karl Suss optical mask aligners in the cleanroom, used to align photomasks with wafers for UV photolithography.
Electron beam lithography (EBL) system used for high-resolution direct-write patterning on substrates in the cleanroom.
Sample chuck with clips used for securing wafers and substrates during loading into a Physical Vapor Deposition (PVD) system.
Scanning Electron Microscope (SEM) image showing a regular array of nanoscale pillars on a substrate surface.
Parylene coater in the cleanroom used for depositing thin, conformal polymer films on substrates.
Spectral reflectance measurement displayed from a Filmetrics system, showing thin-film thickness and optical properties analysis.

PHOTOLITHOGRAPHY

ELECTRON-BEAM LITHOGRAPHY

THIN-FILM DEPOSITION, GROWTH, AND ANNEAL

DRY ETCH & WET PROCESSING

BACK-END & PACKAGING

METROLOGY