AJA ORION 8 DIELECTRIC SPUTTERING


OPERATING INSTRUCTIONS |

GENERAL INFORMATION

This system consists of two 2” magnetron sputtering guns, 300W RF generator, auto matching network and a pulsed DC power supply. Substrates of up to 4” in size can be coated. They system is pumped down with a turbo pump and contains a load lock and is dedicated to dielectric film sputtering. Reactive sputtering is available as well.

Materials available: Al3Nx, ZiO, SiOx, TiN, Al2O3. Other materials may be possible upon request.
Process gases: Ar, Oxygen/Nitrogen.

 

CONTACT INFORMATION
For additional information about the Angstrom EvoVac Deposition System, please contact James Vichiconti at jv2534@columbia.edu or the clean room staff at: cnicleanroom@columbia.edu.