RCA STATION
+ SHARED LABS HOME
+ EXTERNAL USER PROGRAM
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+ BADGER
+ CLEAN ROOM
- CLEAN ROOM HOME
- CLEAN ROOM ACCESS PROTOCOL
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- PROCESS & FABRICATION
- EQUIPMENT LIST
- EQUIPMENT RATES & SUPERUSERS
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- SAFETY
- RELATED LINKS
+ ELECTRON MICROSCOPY
- EM LAB HOME
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- FEI TALOS S-TEM
- ZEISS SIGMA VP SEM
- EM IMAGE GALLERY
+ SHARED MATERIAL CHARACTERIZATION LAB
GENERAL INFORMATION
The RCA station is a designated wet bench for SC1 (DI water:NH4OH:H2O2 5:1:1), SC2 (DI water:HCL,H2O2 6:1:1), and HF dip. The station can be used for cleaning and native oxide strip for both wafers and pieces. Training is required in order to use the station.
CONTACT INFORMATION
For additional information about the wet processing hoods or to request training, please contact James Vichiconti or contact the clean room staff at: cniCR@columbia.edu.