UVOCs UV OZONE CLEANER
The UV Ozone cleaning method is a photo-sensitized damage free oxidation process in which substrate surface contaminant molecules of photoresists, resins, cleaning solvent residues, silicone oils, etc. are excited and/or dissociated by the absorption of short wavelength UV radiation. Atomic oxygen is simultaneously generated when molecular oxygen is dissociated by 184.9nm and ozone by 253.7nm. The 253.7nm radiation is absorbed by most hydrocarbons and also by ozone. The products of this excitation of contaminant molecules react with atomic oxygen to form simpler volatile molecules which desorb from the substrate surface. When both wavelengths are present, atomic oxygen is continuously generated and ozone is continually formed and destroyed.
For additional information about the UVOCs UV Ozone Cleaner, please contact James Vichiconti at email@example.com.