UVOCs UV OZONE CLEANER


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GENERAL INFORMATION

The UV Ozone cleaning method is a photo-sensitized damage free oxidation process in which substrate surface contaminant molecules of photoresists, resins, cleaning solvent residues, silicone oil and grease, etc. are excited and/or dissociated by the absorption of short wavelength UV radiation emitted from a low pressure quartz-mercury vapor lamp. Atomic oxygen is simultaneously generated when molecular oxygen is dissociated by 184.9nm and ozone by 253.7nm. The 253.7nm radiation is absorbed by most hydrocarbons and also by ozone. The products of this excitation of contaminant molecules react with atomic oxygen to form simpler volatile molecules such as CO2 and H2O. When both wavelengths are present, atomic oxygen is continuously generated and ozone is continually formed and destroyed.

CONTACT INFORMATION
For additional information about the UVOCs UV Ozone Cleaner, please contact James Vichiconti at jv2534@columbia.edu.