UVOCs UV OZONE CLEANER
+ SHARED LABS HOME
+ EXTERNAL USER PROGRAM
+ CNI LABS NEWSLETTER
+ BADGER
+ CLEAN ROOM
- CLEAN ROOM HOME
- CLEAN ROOM ACCESS PROTOCOL
- EQUIPMENT TRAINING
- PROCESS & FABRICATION
- EQUIPMENT LIST
- EQUIPMENT RATES & SUPERUSERS
- EQUIPMENT STATUS
- SAFETY
- RELATED LINKS
+ ELECTRON MICROSCOPY
- EM LAB HOME
- SERVICE REQUEST FORM
- EM LAB ACCESS
- TRAINING & CERTIFICATION
- EQUIPMENT LIST & RATES
- FEI TALOS S-TEM
- ZEISS SIGMA VP SEM
- EM IMAGE GALLERY
+ SHARED MATERIAL CHARACTERIZATION LAB
GENERAL INFORMATION
The UV Ozone cleaning method is a photo-sensitized damage free oxidation process in which substrate surface contaminant molecules of photoresists, resins, cleaning solvent residues, silicone oil and grease, etc. are excited and/or dissociated by the absorption of short wavelength UV radiation emitted from a low pressure quartz-mercury vapor lamp. Atomic oxygen is simultaneously generated when molecular oxygen is dissociated by 184.9nm and ozone by 253.7nm. The 253.7nm radiation is absorbed by most hydrocarbons and also by ozone. The products of this excitation of contaminant molecules react with atomic oxygen to form simpler volatile molecules such as CO2 and H2O. When both wavelengths are present, atomic oxygen is continuously generated and ozone is continually formed and destroyed.
CONTACT INFORMATION
For additional information about the UVOCs UV Ozone Cleaner, please contact James Vichiconti at jv2534@columbia.edu or contact the clean room staff at: cniCR@columbia.edu.